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Gate-dielectric stack engineering for high-mobility and low-noise SiMOS quantum devices
A comparison of materials that can be used as a gate dielectric, the thin insulating layer that sits between the metal gate electrode and the underlying silicon in both transistors and Diraq qubits. Measurements show that CMOS-foundry-standard poly-silicon gates deliver the lowest noise in quantum devices, directly linking manufacturing material choices to stable, reliable qubit performance.